The S-MAT 2300(Semiconductor Materials Analysis Tool) is a metrology tool designed to accurately measure thin films, without standards.S-MAT 2300 combines XRR(X-ray Reflectivity), XRF(X-ray Fluorescence)& XRD(X-ray Diffraction)techniques in a single tool, which is to address industry needs at 32, 45, 65 and 90 nm nodes. The S-MAT 2300 handles with ease and precision - single and multi layer stacks, high-k, low-k, ultra thin films, and ALD films, to 5.0 A

The SMAT 2300 offers advanced capabilities that meet thin film process control requirements. The parameters which can be measured by the S-MAT 2300 are layer thickness, density, composition, surface and interstitial roughness, phase identification and crystal orientation of films.