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Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring
Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring
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Home : Products : Thin Film Metrology : S-MAT On - Product

S-MAT 2000 Series - S-MAT | Thin Film Thickness Measurement | Secs Gem | Thin Film Technology | FOUP Wafer Mapping | X Ray Technology

Request More Info - S-MAT | Thin Film Thickness Measurement | Secs Gem | Thin Film Technology | FOUP Wafer Mapping | X Ray Technology

On-Product Measurement Capability

  

Technos next-generation in-line thin-film metrology system combines

• Small spot  X-ray Reflectivity (XRR)

•  Small spot X-ray Fluorescence (XRF)

•  Small spot X-ray Diffraction (XRD)

in one tool for next generation thin film metrology. Technos S-MAT 2300PM system has been designed to provide unique options for the 45nm & 32nm metrology challenges that the semiconductor industry faces. Technos unique small spot X-ray design does not compromise on X-ray intensity while measuring patterned wafers.
S-MAT 2300 Series
Features
Non-contact & non-destructive measurement of thickness, roughness, density,
  composition, crystal orientation and phase identification of thin films
Up to 4 X-ray channels (combination of XRR, XRF, XRD) in one system
Very bright small spot XRF with unique Technos design which translates to
 
  • High throughput
  • High resolution
  • Lowest background
Capability of measuring blanket & patterned wafers in the same system with
  no compromise on throughput.
Small spot XRR & small spot XRD with high intensity.
New fast scan XRR for higher throughput required for production environment
Small spot XRD suited for semicondcutor industry.
Capable of normal XRD & rocking curve XRD.

Special Technos design for reduced contamination inside the tool .

Windows XP Operating System with color camera for pattern recognition

Fab friendly software, full automation capabilities

Applications

  • Barrier / Seed films (Cu/Ta/TaN, etc)
  • Low-k dielectrics
  • High-k dielectrics
  • Gate Oxide measurements
  • Gate dielectrics
  • Metals (silicides, oxides, nitrides)
  • Phase change memory (GST)
  • Under bump metallization (Au, TiN, etc)
  • Multi-layer stacks
 

  Featured Products - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring  

S-MAT On-Product
Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring

Technos On-Product X-Ray Metrology
Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring

  Events - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring  

Oct 7 - 9th 2008

Semicon Europa
Stuttgart Germany
Booth #2673
Technos International - Semiconductor Metrology, X-Ray Measurement Solutions, Semiconductor Industry Solutions, Wafer Contamination Monitoring
Contamination Monitoring: TREX 610 Series | TREX 620 Series | TREX 630 Series | TREX 630i Series | Rapid Scan | TVD 910  
S-MAT On-Product | S-MAT PV XRF
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