| Technos offers a broad range of in-lab and in-fab x-ray
based metrology and contamination measuring systems
that
are developed and refined for use in the manufacture
of silicon wafers and IC's.
Since the development of the first TXRF system in
1987, Technos has continued to deliver improved system
uptime,
lower CoO, and innovative systems to provide new solutions
for the industry's changing requirements. The applied
x-ray methods include:
 |
Total-Reflection X-Ray Fluorescence
(TXRF) |
|
X-Ray Fluorescence (XRF) |
|
X-Ray Reflectivity (XRR) |
|
X-Ray Diffraction (XRD) |
|
Grazing Incidence X-Ray Fluorescence (GIXRF) |
|
Technos also offers
systems based on Vapor Phase Decomposition (VPD)
technology |
|
S-MAT PV XRF, to meet the needs of the photovoltaic industry. |
Technos is the pioneer in using multiple x-ray sources
with dedicated optics. This approach has offered Technos
customers the ability to adapt their tools to meet the
specific requirements of their process. Sources currently
available include: Cr, Mo, W, Ir, and Ag sealed tubes. The
dedicated optics are optimized for maximum x-ray flux
after excitation, resulting in sealed tube performance
that rivals competitor's rotating anode, and with a
much lower CoO..
|
|
applications
